13651969369
當(dāng)前位置：首頁(yè) > 產(chǎn)品中心 > 二維材料 > 六方氮化硼晶體 > CVD銅基單層氮化硼薄膜
簡(jiǎn)要描述：Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.
更新時(shí)間：2024-06-03產(chǎn)品型號(hào)： 廠商性質(zhì)：生產(chǎn)廠家訪 問 量：782相關(guān)文章
Related Articles詳細(xì)介紹
Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Monolayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.
Properties of h-BN
產(chǎn)品咨詢
聯(lián)系人：陳谷一
地址：江蘇省泰州市鳳凰西路168號(hào)
郵箱：taizhou@sunano.com.cn
電話：021-56830191掃一掃以下二維碼了解更多信息
銷售微信咨詢
網(wǎng)站二維碼
歡迎來到